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Santa Clara, CA, United States of America

Luxtron Corporation

USPTO Granted Patents = 65

Trademarks = 2

Forward Citations = 2,371

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38 inventors (with patents filed for the assignee):

Kenneth A Wickersheim (17 out of 19 patents)

Mei H Sun (15 out of 44 patents)

Herbert E Litvak (11 out of 16 patents)

4. Charles W Schietinger (10 out of 11 patents)

5. Bruce E Adams (9 out of 75 patents)

6. Earl M Jensen (7 out of 7 patents)

7. Stanley O Heinemann (5 out of 7 patents)

8. Anh Ngoc Hoang (4 out of 8 patents)

9. Dmitry Vasily Bakin (4 out of 27 patents)

10. Dieter L Rall (4 out of 8 patents)

11. John P Gotthold (3 out of 4 patents)

12. Terry M Stapleton (3 out of 5 patents)

13. Stephen R Phillips (3 out of 10 patents)

14. Steven C Leach (3 out of 6 patents)

15. Robert Champetier (2 out of 2 patents)

Core Competencies:

Temperature Measurement

Layer Thickness

Endpoint Detection

Optical Techniques

Non-Contact Measurement

Fiberoptic Sensors

Signal Processing

Dew Point Measurement

Modular Systems

Luminescent Sensors

Optical Sensors

Thermal Anemometer

65 patents: Sort by Forward Citations

1. 7374335 - In situ optical surface temperature measuring techniques and devices (2008-05-20),

2. 7080940 - In situ optical surface temperature measuring techniques and devices (2006-07-25),

3. 7042581 - Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers (2006-05-09),

4. 6934040 - Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers (2005-08-23),

5. 6654132 - Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers (2003-11-25),

6. 6572265 - In situ optical surface temperature measuring techniques and devices (2003-06-03),

7. 6570662 - Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers (2003-05-27),

8. 6426232 - Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment (2002-07-30),

9. 6406641 - Liquid etch endpoint detection and process metrology (2002-06-18),

10. 6222632 - Polarization interferometer spectrometer with rotatable birefringent element (2001-04-24),

11. 6110752 - Optical techniques of measuring endpoint during the processing of (2000-08-29),

12. 6077452 - Optical techniques of measuring endpoint during the processing of (2000-06-20),

13. 6028669 - Signal processing for in situ monitoring of the formation or removal of (2000-02-22),

14. 6010538 - In situ technique for monitoring and controlling a process of (2000-01-04),

15. 5946082 - Interference removal (1999-08-31),

Company Overview

Luxtron Corporation, based in Santa Clara, CA, specializes in advanced optical measurement techniques. The company focuses on developing innovative solutions for temperature measurement, layer thickness assessment, and endpoint detection. Utilizing non-contact measurement methods and fiberoptic sensors, Luxtron's technologies are integral in various industries, enhancing precision and reliability in signal processing and dew point measurement. Their expertise positions them as a leader in optical measurement applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

65 Patents

#61 in Santa Clara, CA

#1,305 in California

#5,614 in US

#11,344 in the World

Santa Clara, CA, United States of America

Luxtron Corporation

Forward Citations = 2,371

38 inventors:

Kenneth A Wickersheim (17 out of 19 patents)

Mei H Sun (15 out of 44 patents)

Herbert E Litvak (11 out of 16 patents)

4. Charles W Schietinger (10 out of 11 patents)

5. Bruce E Adams (9 out of 75 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Luxtron Corporation. Retrieved from https://idiyas.com/company/luxtron

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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