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Oberkochen, Germany

Leo Elektronenmikroskopie Gmbh

USPTO Granted Patents = 16

Forward Citations = 197

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18 inventors (with patents filed for the assignee):

Gerd Ludwig Benner (4 out of 27 patents)

Eugen Weimer (3 out of 9 patents)

Harald Rose (3 out of 32 patents)

4. Daniel Tobias (2 out of 2 patents)

5. Michael Steigerwald (1 out of 10 patents)

6. Volker Drexel (1 out of 14 patents)

7. Johannes Bihr (1 out of 8 patents)

8. Helmut Müller (1 out of 3 patents)

9. Stephan Kujawa (1 out of 2 patents)

10. Peter Hartel (1 out of 1 patent)

11. Dirk Preikszas (1 out of 2 patents)

12. Jan Bärtle (1 out of 1 patent)

13. Erich Plies (1 out of 1 patent)

14. Armin Huber (1 out of 1 patent)

15. Dieter Krahl (1 out of 2 patents)

16 patents: Sort by Forward Citations

1. 7012262 - Corrector for correcting first-order chromatic aberrations of the first degree (2006-03-14),

2. 6894288 - Manipulator for an optical or particle-optical apparatus (2005-05-17),

3. 6855939 - Particle beam system having a mirror corrector (2005-02-15),

4. 6828565 - Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source (2004-12-07),

5. 6797956 - Electron microscope with annular illuminating aperture (2004-09-28),

6. 6787779 - Apparatus wherein ionizing radiation is generated (2004-09-07),

7. 6784437 - Corrector for correcting first-order chromatic aberrations of the first degree (2004-08-31),

8. 6657211 - Process for electron beam lithography, and electron-optical lithography system (2003-12-02),

9. 6580073 - Monochromator for charged particles (2003-06-17),

10. 6531698 - Particle-optic illuminating and imaging system with a condenser-objective single field lens (2003-03-11),

11. 6498345 - Particle beam device (2002-12-24),

12. 6384412 - Electron microscope with an energy filter having hexapole correctors which are coupled with a projective system downstream of the energy filter (2002-05-07),

13. 6239430 - Particle beam apparatus with energy filter (2001-05-29),

14. 6194729 - Particle beam apparatus (2001-02-27),

15. 6043489 - Positron source (2000-03-28),

LEO Elektronenmikroskopie GmbH is a leading company specializing in electron microscopy technology. With a strong focus on innovation and research, LEO Elektronenmikroskopie GmbH offers a range of high-quality electron microscopes for various applications. Their cutting-edge solutions provide scientists, researchers, and engineers with advanced imaging capabilities, allowing them to explore the world at the nanoscale level. Visit their website for more information on their products and services.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 2 2025

16 Patents

#13 in Oberkochen

#2,625 in Germany

#36,617 in the World

Oberkochen, Germany

Leo Elektronenmikroskopie Gmbh

Forward Citations = 197

18 inventors:

Gerd Ludwig Benner (4 out of 27 patents)

Eugen Weimer (3 out of 9 patents)

Harald Rose (3 out of 32 patents)

4. Daniel Tobias (2 out of 2 patents)

5. Michael Steigerwald (1 out of 10 patents)

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