The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Aug. 20, 2003
Harald Rose, Darmstadt, DE;
Dirk Preikszas, Aschaffenburg, DE;
Peter Hartel, Darmstadt, DE;
Leo Elektronenmikroskopie GmbH, Oberkochen, DE;
Abstract
The invention relates to a particle beam system comprising a particle source (), a mirror corrector (to), and an objective lens (). The mirror corrector comprises an electrostatic mirror () and a magnetic beam deflector (), which is arranged between the particle source () and the electrostatic mirror () as well as between the electrostatic mirror () and the objective lens (). The magnetic beam deflector () is free from dispersion for each single pass. The magnetic beam deflector () also comprises quadrupoles and/or quadrupole components, which are provided in such a manner that a maximum of two planes, which are conjugated with regard to the diffraction plane () of the objective lens (), occur on the entire path length between the first outlet from the magnetic beam deflector () and from the objective lens ().