The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Jul. 16, 2001
Gerd Benner, Aalen, DE;
Leo Elektronenmikroskopie, Oberkochen, DE;
Abstract
The present invention relates to a method for electron beam lithography that consists of a combination of electron beam projection lithography and electron beam writing. In a first step, the exposure of the substrate takes place by imaging of a mask. In a second step, structures not present on the mask are written on the substrate by electron beam writing. The invention furthermore relates to an electron-optical lithography system that can be used both for projection lithography and for electron beam writing. The system has a projective system by means of which a mask plane can be imaged on a reduced scale in a substrate plane. The system furthermore has an electron-optical illumination system by means of which selectively either a large field in the mask plane can be illuminated or the electron beam can be focused in the mask plane or can be shaped to a desired beam profile.