% Expired Patents = 100.0

Forward Citations = 31

Loading Chart...

2 inventors (with patents filed for the assignee):

Farhang F Shadman (6 out of 12 patents)

Bert M Vermeire (6 out of 11 patents)

6 patents: Sort by Forward Citations

1. 8253422 - Method of manufacture of wafers using an electro-chemical residue sensor (ECRS) (2012-08-28),

2. 8120368 - Method of monitoring the clean/rinse/dry processes of patterned wafers using an electro-chemical residue sensor (ECRS) (2012-02-21),

3. 7932726 - Method of design optimization and monitoring the clean/rinse/dry processes of patterned wafers using an electro-chemical residue sensor (ECRS) (2011-04-26),

4. 7489141 - Surface micro sensor and method (2009-02-10),

5. 7332902 - Micro sensor for electrochemically monitoring residue in micro channels (2008-02-19),

6. 7317317 - Shielded micro sensor and method for electrochemically monitoring residue in micro features (2008-01-08),

Company Overview

Environmental Metrology Corporation specializes in providing quality metrology services to ensure accuracy, reliability, and compliance for environmental monitoring instruments. With a team of highly skilled technicians and state-of-the-art equipment, we offer calibration, certification, and repair services for a wide range of environmental monitoring equipment. Our commitment to quality and customer satisfaction sets us apart as a trusted partner in the industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

6 Patents

#112 in Tucson, AZ

#597 in Arizona

#44,949 in US

Tucson, AZ, United States of America

Environmental Metrology Corporation

Forward Citations = 31

2 inventors:

Farhang F Shadman (6 out of 12 patents)

Bert M Vermeire (6 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Environmental Metrology Corporation. Retrieved from https://idiyas.com/company/environmental-metrology

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]