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Woburn, MA, United States of America

Applied Science & Technology, Inc.

USPTO Granted Patents = 35

Trademarks = 5

Forward Citations = 1,831

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33 inventors (with patents filed for the assignee):

Donald K Smith (20 out of 58 patents)

William M Holber (13 out of 37 patents)

Xing Chen (9 out of 47 patents)

4. Eric J Georgelis (9 out of 12 patents)

5. Matthew Mark Besen (7 out of 32 patents)

6. Robert George Begin (4 out of 16 patents)

7. Richard S Post (4 out of 4 patents)

8. Lawrence P Bourget (4 out of 5 patents)

9. Evelio Sevillano (4 out of 4 patents)

10. Andrew Cowe (2 out of 19 patents)

11. Daniel Goodman (2 out of 19 patents)

12. Chunghsin Lee (2 out of 26 patents)

13. Christiane Gottschalk (2 out of 10 patents)

14. Andrzej Bortkiewicz (2 out of 3 patents)

15. Peter J Clarke (2 out of 19 patents)

Core Competencies:

Plasma Chamber

Inductively-Coupled

RF Power Supply

Toroidal Plasma Source

Ozonated Water

Semiconductor Cleaning

Calibration Metrology

Sputter Deposition

Thermal Processing

Reactive Gas Generator

Microwave Reactor

Wear-Resistant Coatings

35 patents: Sort by Forward Citations

1. 6924455 - Integrated plasma chamber and inductively-coupled toroidal plasma source (2005-08-02),

2. 6887339 - RF power supply with integrated matching network (2005-05-03),

3. 6872909 - Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel (2005-03-29),

4. 6815633 - Inductively-coupled toroidal plasma source (2004-11-09),

5. 6805791 - Ozonated water flow and concentration control apparatus (2004-10-19),

6. 6786976 - Method and system for cleaning semiconductor elements (2004-09-07),

7. 6781317 - Methods and apparatus for calibration and metrology for an integrated RF generator system (2004-08-24),

8. 6664497 - Toroidal low-field reactive gas source (2003-12-16),

9. 6559408 - Toroidal low-field reactive gas source (2003-05-06),

10. 6552296 - Toroidal low-field reactive gas source (2003-04-22),

11. 6486431 - Toroidal low-field reactive gas source (2002-11-26),

12. 6388226 - Toroidal low-field reactive gas source (2002-05-14),

13. 6235172 - System for and method of providing a controlled deposition on wafers (2001-05-22),

14. 6234788 - Disk furnace for thermal processing (2001-05-22),

15. 6217272 - In-line sputter deposition system (2001-04-17),

Company Overview

Applied Science & Technology, Inc., based in Woburn, MA, specializes in the development and manufacturing of advanced technology solutions across various sectors. The company focuses on innovative applications in fields such as aerospace, defense, and telecommunications, leveraging cutting-edge research to enhance product performance and reliability. With a commitment to quality and precision, Applied Science & Technology plays a pivotal role in driving technological advancements that meet the evolving needs of its clients.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

35 Patents

#19 in Woburn, MA

#582 in Massachusetts

#9,740 in US

#19,148 in the World

Woburn, MA, United States of America

Applied Science & Technology, Inc.

Forward Citations = 1,831

33 inventors:

Donald K Smith (20 out of 58 patents)

William M Holber (13 out of 37 patents)

Xing Chen (9 out of 47 patents)

4. Eric J Georgelis (9 out of 12 patents)

5. Matthew Mark Besen (7 out of 32 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Applied Science & Technology, Inc.. Retrieved from https://idiyas.com/company/applied-science-and-technology

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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