The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2005
Filed:
Sep. 20, 2001
Daniel Goodman, Lexington, MA (US);
Andrzej Bortkiewicz, Hamilton, MA (US);
Gary D. Alley, Londonderry, NH (US);
Stephen F. Horne, Chelmsford, MA (US);
William M. Holber, Winchester, MA (US);
Daniel Goodman, Lexington, MA (US);
Andrzej Bortkiewicz, Hamilton, MA (US);
Gary D. Alley, Londonderry, NH (US);
Stephen F. Horne, Chelmsford, MA (US);
William M. Holber, Winchester, MA (US);
Applied Science and Technology, Inc., Wilmington, MA (US);
Abstract
The invention features an RF plasma generator. The RF plasma generator includes a variable frequency RF generator, comprising an H-bridge and an RF output. The RF generator generates electromagnetic radiation having a power. The RF plasma generator further includes a matching network that includes at least one variable impedance component. The matching network also includes a first port that is electromagnetically coupled to the output of the RF generator and a second port. The RF plasma generator also includes a load that is electromagnetically coupled to the second port of the matching network, and a plasma chamber for containing a plasma having a power. The plasma chamber is electromagnetically coupled to the load and receives electromagnetic radiation having a power from the load. Adjusting at least one of the frequency of the RF generator and the variable impedance component in the matching network changes the power in the plasma.