The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2018

Filed:

Dec. 22, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hirofumi Haga, Miyagi, JP;

Nobutaka Nakao, Miyagi, JP;

Hideaki Yakushiji, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01J 37/32 (2006.01); A61L 2/24 (2006.01); A61L 2/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); A61L 2/14 (2013.01); A61L 2/24 (2013.01); H01J 37/32449 (2013.01); H01L 21/67017 (2013.01); H01J 37/32834 (2013.01); Y10T 137/0379 (2015.04); Y10T 137/86002 (2015.04); Y10T 137/86027 (2015.04); Y10T 137/86083 (2015.04);
Abstract

An evacuation method used for a vacuum processing apparatus including a vacuum processing chamber is provided. The vacuum processing chamber is evacuated by an exhaust device for a first predetermined period of time by opening a valve connecting the exhaust device with the vacuum processing chamber. A pressure in the vacuum processing chamber is urged to increase by closing the valve and leaving the valve closed for a second predetermined period of time after evacuating the vacuum processing chamber. Evacuating the vacuum processing chamber and urging the pressure in the vacuum processing chamber to increase are performed so as to reduce the pressure in the vacuum processing chamber to a pressure between 6.7 Pa and 13.3×10Pa (between 5 Torr and 10 Torr) without freezing moisture in the vacuum processing chamber.


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