The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Oct. 15, 2015
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Pavel Potocek, Eindhoven, NL;
Franciscus Martinus Henricus Maria van Laarhoven, Waalre, NL;
Faysal Boughorbel, Eindhoven, NL;
Remco Schoenmakers, Best, NL;
Peter Christiaan Tiemeijer, Eindhoven, NL;
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/21 (2006.01); H01J 37/28 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/21 (2013.01); H01J 37/263 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/216 (2013.01); H01J 2237/2802 (2013.01);
Abstract
A Charged Particle Microscope includes The illuminator includes: The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.
Potocek, Pavel. (2018). Charged particle microscope with special aperture plate (U.S. Patent No. 9934936). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9934936
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile