The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
May. 02, 2016
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Chih-Liang Chen, Hsinchu, TW;
Chih-Ming Lai, Hsinchu, TW;
Charles Chew-Yuen Young, Cupertino, CA (US);
Chi-Yeh Yu, Hsinchu, TW;
Jiann-Tyng Tzeng, Hsin Chu, TW;
Kam-Tou Sio, Zhubei, TW;
Pin-Dai Sue, Tainan, TW;
Ru-Gun Liu, Zhubei, TW;
Shih-Wei Peng, Hsinchu, TW;
Wen-Hao Chen, Hsinchu, TW;
Yung-Sung Yen, New Taipei, TW;
Chun-Kuang Chen, Guanxi Township, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
The present disclosure relates to an integrated chip that uses a metal strap to improve performance and reduce electromigration by coupling a middle-end-of-the-line (MEOL) layer to a power rail. In some embodiments, the integrated chip has an active area with a plurality of source/drain regions. The active area contacts a MEOL structure extending in a first direction. A first metal wire extends in a second direction, which is perpendicular to the first direction, at a location overlying the MEOL structure. A metal strap extending in a first direction is arranged over the first metal wire. The metal strap is configured to connect the first metal line to a power rail (e.g., which may be held at a supply or ground voltage), which extends in the second direction. By connecting the MEOL structure to the power rail by way of a metal strap, parasitic capacitance and electromigration may be reduced.