The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2018
Filed:
Mar. 02, 2017
Asml Netherlands B.v., Veldhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Joeri Lof, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Hans Jansen, Eindhoven, NL;
Jacobus Johannus Leonardus Hendricus Verspay, Thorn, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.