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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9881816 B1

PDFFull Text
Date of Patent:
Jan. 30, 2018

Filed:

Feb. 01, 2013

Cleaning composition and method for semiconductor device fabrication

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chia-Wen Li, Hsinchu, TW;

Bo-Wei Chou, Hsinchu, TW;

Shao-Yen Ku, Jhubei, TW;

Chen Ming-Jung, Hsinchu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Eric Golightly

Int. Cl.
CPC ...
C23G 1/02 (2006.01); H01L 21/67 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01); C11D 7/06 (2006.01); C11D 7/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); C11D 7/06 (2013.01); C11D 7/08 (2013.01); C11D 11/0047 (2013.01); H01L 21/02057 (2013.01);
Abstract

A method of cleaning a substrate such as semiconductor substrate for IC fabrication is described that includes cleaning the semiconductor substrate with a mixture of ozone and one of an acid and a base. Exemplary acids and bases include HCl, HF, and NHOH. The cleaning mixture may further include de-ionized water. In an embodiment, the mixture is sprayed onto a heated substrate surface.

Find Patent Forward Citations

Li, Chia-Wen. (2018). Cleaning composition and method for semiconductor device fabrication (U.S. Patent No. 9881816). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9881816

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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