Chen Ming-Jung

Title: Innovations by Chen Ming-Jung in Semiconductor Fabrication

Introduction

Chen Ming-Jung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor device fabrication. His innovative approach to cleaning compositions has the potential to enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Chen Ming-Jung holds a patent for a cleaning composition and method for semiconductor device fabrication. This patent describes a method of cleaning a substrate, such as a semiconductor substrate, using a mixture of ozone and either an acid or a base. Exemplary acids and bases mentioned in the patent include HCl, HF, and NHOH. The cleaning mixture may also incorporate de-ionized water. In one embodiment, the mixture is sprayed onto a heated substrate surface, which can improve the cleaning process.

Career Highlights

Chen Ming-Jung is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this prestigious company has allowed him to contribute to advancements in semiconductor technology. His innovative cleaning methods are expected to play a crucial role in improving the quality of semiconductor devices.

Collaborations

Chen Ming-Jung has collaborated with notable colleagues, including Chia-Wen Li and Bo-Wei Chou. These collaborations have likely fostered an environment of innovation and creativity, leading to advancements in semiconductor fabrication techniques.

Conclusion

Chen Ming-Jung's contributions to semiconductor device fabrication through his innovative cleaning methods highlight the importance of research and development in the technology sector. His work continues to influence the industry and pave the way for future advancements.