The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2017
Filed:
Jun. 24, 2016
Applied Materials, Inc., Santa Clara, CA (US);
Prashant Kumar Kulshreshtha, San Jose, CA (US);
Sudha Rathi, San Jose, CA (US);
Praket P. Jha, San Jose, CA (US);
Saptarshi Basu, San Jose, CA (US);
Kwangduk Douglas Lee, Redwood City, CA (US);
Martin J. Seamons, San Jose, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Ziqing Duan, Sunnyvale, CA (US);
Lei Jing, Santa Clara, CA (US);
Mandar B. Pandit, Santa Clara, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods for modulating local stress and overlay error of one or more patterning films may include modulating a gas flow profile of gases introduced into a chamber body, flowing gases within the chamber body toward a substrate, rotating the substrate, and unifying a center-to-edge temperature profile of the substrate by controlling the substrate temperature with a dual zone heater. A chamber for depositing a film may include a chamber body comprising one or more processing regions. The chamber body may include a gas distribution assembly having a blocker plate for delivering gases into the one or more processing regions. The blocker plate may have a first region and a second region, and the first region and second region each may have a plurality of holes. The chamber body may have a dual zone heater.