The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Sep. 21, 2016
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Mun Tat Yap, Singapore, SG;

Shiang Yang Ong, Singapore, SG;

Namchil Mun, Singapore, SG;

Tat Wei Chua, Singapore, SG;

Raj Verma Purakh, Singapore, SG;

Jeoung Mo Koo, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/66 (2006.01); H01L 23/535 (2006.01); H01L 21/768 (2006.01); H01L 21/762 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0623 (2013.01); H01L 21/76224 (2013.01); H01L 21/76895 (2013.01); H01L 22/12 (2013.01); H01L 23/535 (2013.01); H01L 27/0207 (2013.01); H01L 29/0649 (2013.01);
Abstract

Integrated circuits and methods of producing such integrated circuits are provided. In an exemplary embodiment, a method of producing an integrated circuit includes determining a guard ring width within an integrated circuit design layout, where a guard ring with the guard ring width surrounds an active area in the integrated circuit design layout. A deep trench location is calculated for replacing the guard ring, where the deep trench location depends on the guard ring width. The guard ring in the integrated circuit design layout is replaced with a deep trench having the deep trench location. The deep trench is formed within a substrate at the deep trench location, where the deep trench surrounds the active area.


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