The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Jun. 13, 2016
Tokyo Electron Limited, Tokyo, JP;
Hiraku Murakami, Miyagi, JP;
Nobutaka Sasaki, Miyagi, JP;
Shigeru Senzaki, Miyagi, JP;
Takanori Banse, Miyagi, JP;
Hiroshi Tsujimoto, Miyagi, JP;
Keigo Toyoda, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
Disclosed is a plasma processing method. The method includes forming a protective film on an inner wall surface of a processing container of a plasma processing apparatus; and executing a processing on a workpiece within the processing container. When forming the protective film, a protective film forming gas is supplied from an upper side of the space between the mounting table and the side wall of the processing container so that plasma is generated. When executing the processing, a workpiece processing gas is supplied from an upper side of the mounting table so that plasma is generated.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile