The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
May. 19, 2016
Globalfoundries Inc., Grand Cayman, KY;
International Business Machines Corporation, Armonk, NY (US);
Shariq Siddiqui, Albany, NY (US);
Frank W. Mont, Troy, NY (US);
Xunyuan Zhang, Albany, NY (US);
Brown Peethala, Albany, NY (US);
Douglas M. Trickett, Altamont, NY (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method includes, for example, providing an intermediate semiconductor structure comprising a metallic layer, a patternable layer disposed over the metallic layer, and a hard mask disposed over the patternable layer, the intermediate semiconductor structure comprising a plurality of vias extending through the hard mask onto the metallic layer, depositing a sacrificial barrier layer over the intermediate semiconductor structure and in the plurality of vias, removing a portion of the sacrificial barrier layer between the plurality of vias while maintaining a portion of the sacrificial barrier layer in the plurality of vias, forming a trench in the patternable layer between the removed portion of the sacrificial barrier layer and the plurality of vias, and removing the remaining portions of the sacrificial barrier layer from the plurality of vias.