The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Feb. 12, 2015
Applicant:

Shanghai Micro Electronics Equipment Co., Ltd., Shanghai, CN;

Inventors:

Feihong Liao, Shanghai, CN;

Yuebin Zhu, Shanghai, CN;

Haili Jia, Shanghai, CN;

Shuping Hu, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70725 (2013.01); G03F 7/70758 (2013.01); G03F 7/70775 (2013.01);
Abstract

A fine-motion module for use in a wafer stage of a photolithography tool includes: a base (); a fine-motion plate (); a plurality of vertical motors (), fixed between the base and the fine-motion plate; a plurality of gravity compensators (), each having one end fixed on the base and the other end configured to support the fine-motion plate; a plurality of absolute-position sensors (), configured to measure an absolute position of the fine-motion plate and to adjust pressures in the gravity compensators based on the obtained absolute-position measurements such that the absolute position of the fine-motion plate is changed to a predetermined initial vertical position; and a plurality of relative-position sensors (), configured to measure a relative position of the fine-motion plate to the base and to control the fine-motion plate based on the obtained relative-position measurements, thereby moving the fine-motion plate to a relative zero position.


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