Feihong Liao

Title: Innovations of Feihong Liao in Photolithography Technology

Introduction

Feihong Liao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of photolithography, particularly in developing tools and methods that enhance the precision and efficiency of semiconductor manufacturing. With a total of two patents to his name, Liao's work is recognized for its innovative approach to addressing challenges in photolithography.

Latest Patents

Liao's latest patents include a photolithography tool and a method for compensating for surface deformation in the carrier of the photolithography tool. This invention introduces carrier surface deformation compensation elements that are strategically placed at the bottom of the carrier. These elements are designed to detect and compensate for surface deformation, ensuring more accurate results in photolithography processes. The method employs carrier surface deformation detection modules and an automated closed-loop controller to adjust compensating forces based on detected deformations.

Another notable patent is the lithography machine workpiece table and vertical position initialization method. This invention features a fine-motion module that includes a base, a fine-motion plate, and several vertical motors. The system is equipped with gravity compensators and absolute-position sensors that work together to measure and adjust the position of the fine-motion plate. This innovation allows for precise control of the plate's vertical position, enhancing the overall functionality of photolithography tools.

Career Highlights

Feihong Liao is currently employed at Shanghai Micro Electronics Equipment (Group) Co., Ltd. His role at the company allows him to apply his expertise in photolithography and contribute to advancements in semiconductor manufacturing technology. Liao's work is characterized by a commitment to innovation and a focus on solving complex engineering challenges.

Collaborations

Liao collaborates with talented colleagues, including Yinlei Wei and Fuqiang Yang. Their combined efforts contribute to the development of cutting-edge technologies in the field of microelectronics.

Conclusion

Feihong Liao's contributions to photolithography technology exemplify the importance of innovation in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in this field and offer practical solutions that enhance manufacturing processes. Liao's work continues to influence the future of photolithography and semiconductor technology.