The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Dec. 09, 2014
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Robert A. May, Chandler, AZ (US);

Sri Ranga Sai Boyapati, Chandler, AZ (US);

Amruthavalli P. Alur, Tempe, AZ (US);

Daniel N. Sobieski, Phoenix, AZ (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/09 (2006.01); C22C 9/00 (2006.01); H01L 23/12 (2006.01); H01L 23/49 (2006.01); H01L 23/498 (2006.01);
U.S. Cl.
CPC ...
C22C 9/00 (2013.01); H01L 23/12 (2013.01); H01L 23/49 (2013.01); H01L 23/49866 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/32225 (2013.01); H01L 2224/73204 (2013.01); H01L 2924/15311 (2013.01); H01L 2924/3511 (2013.01);
Abstract

Microelectronic substrates having copper alloy conductive routes to reduce warpage due to differing coefficient of thermal expansion of the components used to form the microelectronic substrates. In one embodiment, the conductive routes of the microelectronic substrate may comprise an alloy of copper and an alloying metal of tungsten, molybdenum, or a combination thereof. In another embodiment, the conductive routes of the microelectronic substrate may comprise an alloy of copper, an alloying metal of tungsten, molybdenum, or a combination thereof, and a co-deposition metal of nickel, cobalt, iron, or a combination thereof. In still another embodiment, the copper alloy conductive routes may have copper concentrations which are graded therethrough, which may enable better pattern formation during a subtractive etching process used to form the copper alloy conductive routes.


Find Patent Forward Citations

Loading…