The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Feb. 11, 2013
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Fei-Gwo Tsai, Taipei, TW;

Bo-Tsun Liu, Taipei, TW;

Chieh-Huan Ku, New Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 1/84 (2012.01); G03F 1/82 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70666 (2013.01); G03F 1/84 (2013.01); G03F 7/00 (2013.01); G03F 7/70483 (2013.01); G03F 7/70525 (2013.01); G03F 7/70925 (2013.01); G03F 1/82 (2013.01);
Abstract

The present disclosure provides a method that includes capturing a first image of a mask in a first exposure apparatus using a first exposure source and a first imaging sensor; capturing a second image of the mask in a second exposure apparatus using a second exposure source and a second imaging sensor; comparing the first image of the mask and the second image of the mask for a difference therebetween; and determining an action according to the difference.


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