Chieh-Huan Ku

Title: Chieh-Huan Ku: Innovator in Lithography Technology

Chieh-Huan Ku is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of lithography, particularly in the area of mask inspection. His innovative approach has led to the development of a unique patent that enhances the efficiency and accuracy of lithographic processes.

Latest Patents

Chieh-Huan Ku holds a patent for a "Lithography system and method for mask inspection." This patent outlines a method that includes capturing a first image of a mask in a first exposure apparatus using a first exposure source and a first imaging sensor. It also involves capturing a second image of the mask in a second exposure apparatus using a second exposure source and a second imaging sensor. The process includes comparing the first image of the mask and the second image of the mask for any differences and determining an action based on those differences. This innovative method is crucial for improving the quality of lithographic outputs.

Career Highlights

Chieh-Huan Ku is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to contribute to cutting-edge technologies that are essential for modern electronics. His expertise in lithography has positioned him as a valuable asset in the field.

Collaborations

Chieh-Huan Ku has collaborated with notable colleagues, including Fei-Gwo Tsai and Bo-Tsun Liu. These collaborations have fostered an environment of innovation and have led to advancements in lithographic techniques.

Conclusion

Chieh-Huan Ku is a distinguished inventor whose work in lithography has made a significant impact on the semiconductor industry. His patent for a mask inspection method exemplifies his commitment to innovation and excellence. His contributions continue to shape the future of lithographic technology.