The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Sep. 18, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Michael A. Carcasi, Austin, TX (US);
Mark H. Somervell, Austin, TX (US);
Benjamen M. Rathsack, Austin, TX (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); B81C 1/00 (2006.01); G03F 7/00 (2006.01); H01L 21/268 (2006.01); H01L 21/28 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02345 (2013.01); B81C 1/00031 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); H01L 21/02118 (2013.01); H01L 21/268 (2013.01); H01L 22/20 (2013.01); B81C 2201/0149 (2013.01); H01L 21/28123 (2013.01); H01L 22/12 (2013.01);
Abstract
A method of patterning a layered substrate is provided that includes forming a layer of a block copolymer on a substrate, annealing the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed, and annealing the layer of the block copolymer a second time to refine or modify the microphase segregation, where one of the annealing steps uses an absorption based heating method.
Published as: