The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2017
Filed:
Mar. 19, 2014
Applicants:
Nuflare Technology, Inc, Yokohama-shi, Kanagawa-ken, JP;
Denso Corporation, Kariya-shi, Aichi-ken, JP;
Inventors:
Hideki Ito, Yokohama, JP;
Hidekazu Tsuchida, Yokosuka, JP;
Isaho Kamata, Tokyo, JP;
Masahiko Ito, Yokosuka, JP;
Masami Naito, Inazawa, JP;
Hiroaki Fujibayashi, Chiryu, JP;
Ayumu Adachi, Toyota, JP;
Koichi Nishikawa, Nagoya, JP;
Assignees:
NuFlare Technology, Inc., Yokohama-shi, JP;
Denso Corporation, Kariya-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/44 (2006.01); C30B 25/10 (2006.01); C30B 25/14 (2006.01); C30B 25/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); C23C 16/4408 (2013.01); C30B 25/10 (2013.01); C30B 25/14 (2013.01); C30B 25/16 (2013.01); H01L 21/67109 (2013.01);
Abstract
At the time of transporting a substrate into or from a space where a film formation process is performed, the space where the film formation process is performed, a space where a lower heateris provided, and a space where an upper heateris provided are made in an inert gas atmosphere.