The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Dec. 23, 2011
Annalisa Cappellani, Portland, OR (US);
Peter G. Tolchinsky, Beaverton, OR (US);
Kelin J. Kuhn, Aloha, OR (US);
Glenn A. Glass, Beaverton, OR (US);
Van H. Le, Portland, OR (US);
Annalisa Cappellani, Portland, OR (US);
Peter G. Tolchinsky, Beaverton, OR (US);
Kelin J. Kuhn, Aloha, OR (US);
Glenn A. Glass, Beaverton, OR (US);
Van H. Le, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Common-substrate semiconductor devices having nanowires or semiconductor bodies with differing material orientation or composition and methods to form such common-substrate devices are described. For example, a semiconductor structure includes a first semiconductor device having a first nanowire or semiconductor body disposed above a crystalline substrate. The first nanowire or semiconductor body is composed of a semiconductor material having a first global crystal orientation. The semiconductor structure also includes a second semiconductor device having a second nanowire or semiconductor body disposed above the crystalline substrate. The second nanowire or semiconductor body is composed of a semiconductor material having a second global crystal orientation different from the first global orientation. The second nanowire or semiconductor body is isolated from the crystalline substrate by an isolation pedestal disposed between the second nanowire or semiconductor body and the crystalline substrate.