The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Mar. 02, 2016
United Microelectronics Corp., Hsin-Chu, TW;
Tong-Jyun Huang, Tainan, TW;
Li-Wei Feng, Kaohsiung, TW;
Shih-Hung Tsai, Tainan, TW;
Jyh-Shyang Jenq, Pingtung County, TW;
Chien-Ting Lin, Hsinchu, TW;
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Abstract
A method of decreasing fin bending, includes providing a substrate including a plurality of fins, wherein a plurality of trenches are defined by the fins, the trenches include a first trench and a second trench, and the second trench is wider than the first trench. Later, a flowable chemical vapor deposition process is performed to form a silicon oxide layer covering the fins, filling up the first trench and partially filling in the second trench. After that, the silicon oxide layer is solidified by a UV curing process. Finally, after the UV curing process, the silicon oxide layer is densified by a steam anneal process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile