The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Jul. 29, 2014
Applicant:
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Inventors:
Yasunari Sohda, Tokyo, JP;
Takeyoshi Ohashi, Tokyo, JP;
Takafumi Miwa, Tokyo, JP;
Hajime Kawano, Tokyo, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/14 (2006.01); G21K 1/093 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G21K 1/093 (2013.01); H01J 37/28 (2013.01); H01J 2237/12 (2013.01); H01J 2237/14 (2013.01); H01J 2237/1534 (2013.01);
Abstract
To improve the efficiency of generation of chromatic aberrations of an energy filter for reducing energy distribution. Mounted are an energy filter for primary electrons, the energy filter having a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other. An electron lens is arranged between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.