The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Sep. 20, 2013
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Justin Lloyd Kreuzer, Trumbull, CT (US);
Simon Gijsbert Josephus Mathijssen, Den Bosch, NL;
Gerrit Johannes Nijmeijer, Larchmont, NY (US);
J. Christian Swindal, Ridgefield, CT (US);
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
ASML HOLDING N.V., Veldhoven, NL;
Abstract
An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.