The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2016

Filed:

Sep. 23, 2014
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Ralf Frese, Oberkochen, DE;

Michael Samaniego, Ulm, DE;

Markus Deguenther, Aalen, DE;

Helmut Haidner, Aalen, DE;

Rainer Hoch, Aalen, DE;

Martin Schriever, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/42 (2006.01); G01M 11/02 (2006.01); G01M 11/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0207 (2013.01); G01M 11/005 (2013.01); G03F 7/706 (2013.01);
Abstract

A measuring system () for measuring an imaging quality of an EUV lens () includes a diffractive test structure (), a measurement light radiating device () which is configured to radiate measurement light () in the EUV wavelength range onto the test structure, a variation device () for varying at least one image-determining parameter of an imaging of the test structure that is effected by a lens, a detector () for recording an image stack including a plurality of images generated with different image-determining parameters being set, and an evaluation device () which is configured to determine the imaging quality of the lens from the image stack.


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