The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Aug. 17, 2015
Ict Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh, Heimstetten, DE;
Stefan Lanio, Erding, DE;
John Breuer, München, DE;
Jürgen Frosien, Riemerling, DE;
Matthias Firnkes, Walpertskirchen, DE;
Johannes Hopster, Gauting, DE;
Abstract
A beam separator device () is described. The beam separator device () includes a first deflector () providing a first magnetic deflection field (B) for deflecting a charged particle beam () propagating along a beam entrance axis (A) by a first deflection angle (α); a second deflector () arranged downstream from the first deflector () providing a second magnetic deflection field (B) for deflecting the charged particle beam by a second deflection angle (α) in the direction of an intermediate beam axis (A), wherein the second deflector () is configured for deflecting the charged particle beam () re-entering the beam separator device () along the intermediate beam axis (A) by a third deflection angle (α); a third deflector () arranged downstream from the second deflector () providing a third magnetic deflection field (B) for deflecting the charged particle beam () by a fourth deflection angle (α) in the direction of a beam exit axis (A); a first rotation-free lens to be arranged at a first crossover (X) of the charged particle beam between the first deflector () and the second deflector () for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector; and a second rotation-free lens to be arranged at a second crossover (X) of the charged particle beam between the second deflector () and the third deflector () for at least partially compensating for a dispersion introduced by at least one of the second deflector and the third deflector.