The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2016
Filed:
Jan. 10, 2013
Asml Netherlands B.v., Velhoven, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Olav Waldemar Vladimir Frijns, Rosmalen, NL;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Viacheslav Medvedev, Moscow, RU;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.