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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9395630 B1

PDFFull Text
Date of Patent:
Jul. 19, 2016

Filed:

Mar. 17, 2011

Lithographic apparatus and method

Applicants:

Andrei Mikhailovich Yakunin, Eindhoven, NL;

Vadim Yevgenyevich Banine, Deurne, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Harmen Klaas Van Der Schoot, Vught, NL;

Lucas Henricus Johannes Stevens, Eindhoven, NL;

Maarten Van Kampen, Eindhoven, NL;

Inventors:

Andrei Mikhailovich Yakunin, Eindhoven, NL;

Vadim Yevgenyevich Banine, Deurne, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Harmen Klaas Van Der Schoot, Vught, NL;

Lucas Henricus Johannes Stevens, Eindhoven, NL;

Maarten Van Kampen, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman LLP

Primary Examiner:

Steven H Whitesell Gordon

Int. Cl.
CPC ...
G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C01B 31/04 (2006.01); G02B 5/08 (2006.01); G02B 5/20 (2006.01); G02B 27/00 (2006.01); G03F 1/24 (2012.01); G03F 1/62 (2012.01); G21K 1/06 (2006.01); H01B 1/04 (2006.01); H01B 1/24 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C01B 31/04 (2013.01); G02B 5/0816 (2013.01); G02B 5/0891 (2013.01); G02B 5/204 (2013.01); G02B 5/208 (2013.01); G02B 27/0006 (2013.01); G03B 27/54 (2013.01); G03F 1/24 (2013.01); G03F 1/62 (2013.01); G03F 7/70916 (2013.01); G03F 7/70958 (2013.01); G03F 7/70983 (2013.01); G21K 1/062 (2013.01); H01B 1/04 (2013.01); H01B 1/24 (2013.01); G21K 2201/061 (2013.01);
Abstract

A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

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