The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Jul. 30, 2012
Dirk Heinrich Ehm, Lauchheim, DE;
Maarten Van Kampen, Eindhoven, NL;
Stefan-wolfgang Schmidt, Aalen, DE;
Vadim Yevgenyevich Banine, SB Deurne, NL;
Erik Loopstra, Eindhoven, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Maarten van Kampen, Eindhoven, NL;
Stefan-Wolfgang Schmidt, Aalen, DE;
Vadim Yevgenyevich Banine, SB Deurne, NL;
Erik Loopstra, Eindhoven, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An arrangement for use in a projection exposure tool () for microlithography comprises a reflective optical element () and a radiation detector (). The reflective optical element () comprises a carrier element () guaranteeing the mechanical strength of the optical element () and a reflective coating () disposed on the carrier element () for reflecting a use radiation (). The carrier element () is made of a material which upon interaction with the use radiation () emits a secondary radiation () the wavelength of which differs from the wavelength of the use radiation (), and the radiation detector () is configured to detect the secondary radiation ().