The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Jun. 11, 2010
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Igor Petrus Maria Bouchoms, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Erik Roelof Loopstra, Heeze, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Yücel Kök, Veldhoven, NL;
Johannes Van ES, Zwolle, NL;
Herman Boom, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Igor Petrus Maria Bouchoms, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Erik Roelof Loopstra, Heeze, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Martinus Cornelis Maria Verhagen, Valkenswaard, NL;
Yücel Kök, Veldhoven, NL;
Johannes Van Es, Zwolle, NL;
Herman Boom, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.