The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Feb. 26, 2009
Naoki Matsumoto, Hyogo, JP;
Kazuto Takai, Hyogo, JP;
Reika Ko, Chiba, JP;
Nobuyuki Okayama, Hyogo, JP;
Naoki Matsumoto, Hyogo, JP;
Kazuto Takai, Hyogo, JP;
Reika Ko, Chiba, JP;
Nobuyuki Okayama, Hyogo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma etching apparatusincludes a mounting table that holds a semiconductor substrate W thereon; a first heaterthat heats a central region of the semiconductor substrate W held on the mounting table; a second heaterthat heats an edge region around the central region of the semiconductor substrate W held on the mounting table; a reactant gas supply unitthat supplies a reactant gas for a plasma process toward the central region of the semiconductor substrate W held on the mounting table; and a control unitthat performs a plasma etching process on the semiconductor substrate W while controlling the first heaterand the second heaterto heat the central region and the edge region of the processing target substrate W held on the mounting tableto different temperatures.