The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Jun. 02, 2015
Applicant:

Plasma-therm Llc, St. Petersburg, FL (US);

Inventors:

Rich Gauldin, St. Petersburg, FL (US);

Dwarakanath Geerpuram, St. Petersburg, FL (US);

Ken Mackenzie, Palm Harbor, FL (US);

Thierry Lazerand, St. Petersburg, FL (US);

David Pays-Volard, St. Petersburg, FL (US);

Linnell Martinez, Lakeland, FL (US);

Russell Westerman, Land O'Lakes, FL (US);

Gordon M. Grivna, Mesa, AZ (US);

Jason Doub, Pocatello, ID (US);

Assignee:

Plasma-Therm LLC, St. Petersburg, FL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); H01L 21/00 (2006.01); H01L 21/683 (2006.01); H01L 21/78 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6835 (2013.01); H01L 21/78 (2013.01); H01J 37/32623 (2013.01); H01J 37/32633 (2013.01); H01J 37/32642 (2013.01); H01J 37/32651 (2013.01);
Abstract

The present invention provides a method for plasma dicing a substrate. The method comprising: providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; placing the substrate on a carrier support to form a work piece; providing an intermediate ring interposed between the substrate and the frame; loading the work piece onto the work piece support; generating a plasma through the plasma source; and etching the work piece through the generated plasma.


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