The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2015
Filed:
Aug. 11, 2010
Michio Hatano, Hitachinaka, JP;
Tetsuya Sawahata, Hitachinaka, JP;
Yasuko Watanabe, Mito, JP;
Mitsugu Sato, Hitachinaka, JP;
Sukehiro Ito, Hitachinaka, JP;
Takashi Ohshima, Saitama, JP;
Hiroyuki Honda, Hitachinaka, JP;
Michio Hatano, Hitachinaka, JP;
Tetsuya Sawahata, Hitachinaka, JP;
Yasuko Watanabe, Mito, JP;
Mitsugu Sato, Hitachinaka, JP;
Sukehiro Ito, Hitachinaka, JP;
Takashi Ohshima, Saitama, JP;
Hiroyuki Honda, Hitachinaka, JP;
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Abstract
Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.