The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
Oct. 01, 2014
Applicants:
Asml Netherlands B.v., Veldhoven, NL;
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Christiaan Alexander Hoogendam, Veldhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Bernhard Gellrich, Aalen, DE;
Andreas Wurmbrand, Aalen-Reichenbach, DE;
Assignees:
ASML NETHERLANDS B.V., Veldhoven, NL;
CARL ZEISS SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.