The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Nov. 16, 2011
Jing Ruei LU, Taipei, TW;
Yu-chih Liu, Taipei, TW;
Ming-chung Sung, Taichung, TW;
Wei-ting Lin, Taipei, TW;
Chien-kuo Chang, Zhubei, TW;
Jing Ruei Lu, Taipei, TW;
Yu-Chih Liu, Taipei, TW;
Ming-Chung Sung, Taichung, TW;
Wei-Ting Lin, Taipei, TW;
Chien-Kuo Chang, Zhubei, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A system for and a method of curing a material is provided. A material, such as an underfill material, is rotated during a curing process. The curing system may include a chamber, a holder to support one or more workpieces, and a rotating mechanism. The rotating mechanism rotates the workpieces during the curing process. The chamber may include one or more heat sources and fans, and may further include a controller. The curing process may include varying the rotation speed, continuously rotating, periodically rotating, or the like.