The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Oct. 31, 2011
Guorong V. Zhuang, Santa Clara, CA (US);
Shankar Krishnan, Santa Clara, CA (US);
Johannes D. DE Veer, Menlo Park, CA (US);
Klaus Flock, Mountainview, CA (US);
David Y. Wang, Santa Clara, CA (US);
Lawrence D. Rotter, Pleasanton, CA (US);
Guorong V. Zhuang, Santa Clara, CA (US);
Shankar Krishnan, Santa Clara, CA (US);
Johannes D. de Veer, Menlo Park, CA (US);
Klaus Flock, Mountainview, CA (US);
David Y. Wang, Santa Clara, CA (US);
Lawrence D. Rotter, Pleasanton, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.