The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Feb. 22, 2008
Kaoru Maekawa, Albany, NY (US);
Hiroyuki Nagai, Nirasaki, JP;
Tatsuo Hatano, Nirasaki, JP;
Takashi Sakuma, Nirasaki, JP;
Kaoru Maekawa, Albany, NY (US);
Hiroyuki Nagai, Nirasaki, JP;
Tatsuo Hatano, Nirasaki, JP;
Takashi Sakuma, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
The objective of the present invention is to provide a technique capable of easily forming an alloy layer containing an additive metal on an object to provide a concentration gradient in a thickness direction by sputtering in one treatment vessel. That is, the present invention can form a film with the desired concentration, and includes a first film forming process and a second film forming process that changes at least one of, the pressure in the treatment vessel, and the electric power so they are different from the first film forming process, so that the concentration of the additive metal is different from the concentration of the additive metal of the first alloy film.