The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2015
Filed:
Jan. 25, 2013
Suryadevara V. Babu, Potsdam, NY (US);
Hariprasad Amanapu, Heverlee, BE;
Uma Rames Krishna Laguda, Potsdam, NY (US);
Ranganath Teki, Valatie, NY (US);
Suryadevara V. Babu, Potsdam, NY (US);
Hariprasad Amanapu, Heverlee, BE;
Uma Rames Krishna Laguda, Potsdam, NY (US);
Ranganath Teki, Valatie, NY (US);
Sematech, Inc., Albany, NY (US);
Clarkson University, Potsdam, NY (US);
Abstract
A process for abrasive-free chemical mechanical planarization of silicon thin film coated EUV mask substrates is disclosed. The process removes bumps and pits on the substrate thereby mitigating reflective errors in the mask. The process employs a two-step polishing procedure, in which the second step is abrasive-free and uses an amine or amine salt as the polishing agent.