Uma Rames Krishna Laguda

Title: Uma Rames Krishna Laguda: Innovator in Abrasive-Free Planarization Technology

Introduction

Uma Rames Krishna Laguda is a notable inventor based in Potsdam, NY (US). She has made significant contributions to the field of chemical mechanical planarization, particularly in the context of extreme ultraviolet (EUV) mask substrates. Her innovative approach addresses critical challenges in the manufacturing process of semiconductor devices.

Latest Patents

Laguda holds a patent for "Abrasive-free planarization for EUV mask substrates." This patent describes a process for abrasive-free chemical mechanical planarization of silicon thin film coated EUV mask substrates. The process effectively removes bumps and pits on the substrate, thereby mitigating reflective errors in the mask. It employs a two-step polishing procedure, where the second step is abrasive-free and utilizes an amine or amine salt as the polishing agent. This innovation is crucial for enhancing the precision and quality of EUV lithography.

Career Highlights

Throughout her career, Laguda has worked with prominent organizations such as Sematech, Inc. and Clarkson University. Her experience in these institutions has allowed her to develop and refine her expertise in semiconductor manufacturing processes.

Collaborations

Laguda has collaborated with talented individuals in her field, including Suryadevara Vijayakumar Babu and Hariprasad Amanapu. These collaborations have contributed to her innovative work and the advancement of technology in chemical mechanical planarization.

Conclusion

Uma Rames Krishna Laguda is a pioneering inventor whose work in abrasive-free planarization technology has the potential to significantly impact the semiconductor industry. Her contributions are vital for improving the manufacturing processes of advanced electronic devices.