The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

May. 05, 2009
Applicants:

Vadim Yevgenyevich Banine, Deurne, NL;

Wilhelmus Petrus DE Boeij, Veldhoven, NL;

Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;

Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G03F 7/70116 (2013.01); G03F 7/70575 (2013.01);
Abstract

A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.


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