The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Jul. 01, 2013
Applicant:

Epowersoft, Inc., San Jose, CA (US);

Inventors:

Linda Romano, Sunnyvale, CA (US);

Andrew P. Edwards, San Jose, CA (US);

Richard J. Brown, Los Gatos, CA (US);

David P. Bour, Cupertino, CA (US);

Hui Nie, Cupertino, CA (US);

Isik C. Kizilyalli, San Francisco, CA (US);

Thomas R. Prunty, Santa Clara, CA (US);

Mahdan Raj, Cupertino, CA (US);

Assignee:

AVOGY, INC., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/872 (2006.01); H01L 21/306 (2006.01); H01L 29/47 (2006.01); H01L 29/20 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0615 (2013.01); H01L 21/30621 (2013.01); H01L 29/66212 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 29/872 (2013.01); H01L 29/0619 (2013.01); H01L 29/0657 (2013.01); H01L 29/1066 (2013.01); H01L 29/2003 (2013.01); H01L 29/475 (2013.01);
Abstract

A semiconductor structure includes a III-nitride substrate with a first side and a second side opposing the first side. The III-nitride substrate is characterized by a first conductivity type and a first dopant concentration. The semiconductor structure also includes a III-nitride epitaxial layer of the first conductivity type coupled to the first surface of the III-nitride substrate, and a first metallic structure electrically coupled to the second surface of the III-nitride substrate. The semiconductor structure further includes an AlGaN epitaxial layer coupled to the III-nitride epitaxial layer of the first conductivity type, and a III-nitride epitaxial structure of a second conductivity type coupled to the AlGaN epitaxial layer. The III-nitride epitaxial structure comprises at least one edge termination structure.


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