The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Feb. 09, 2012
Zhongping Cai, Fremont, CA (US);
Yury Yuditsky, Mountain View, CA (US);
Anatoly Romanovsky, Palo Alto, CA (US);
Alexander Slobodov, San Jose, CA (US);
Zhongping Cai, Fremont, CA (US);
Yury Yuditsky, Mountain View, CA (US);
Anatoly Romanovsky, Palo Alto, CA (US);
Alexander Slobodov, San Jose, CA (US);
KLA-Tencor Corp., Milpitas, CA (US);
Abstract
Various embodiments for extended defect sizing range for wafer inspection are provided. One inspection system includes an illumination subsystem configured to direct light to the wafer. The system also includes an image sensor configured to detect light scattered from wafer defects and to generate output responsive to the scattered light. The image sensor is also configured to not have an anti-blooming feature such that when a pixel in the image sensor reaches full well capacity, excess charge flows from the pixel to one or more neighboring pixels in the image sensor. The system further includes a computer subsystem configured to detect the defects on the wafer using the output and to determine a size of the defects on the wafer using the output generated by a pixel and any neighboring pixels of the pixel to which the excess charge flows.