The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Oct. 16, 2014
Kla-tencor Corporation, Milpitas, CA (US);
Daniel Kandel, Aseret, IL;
Vladimir Levinski, Nazereth Illit, IL;
Alexander Svizher, Haifa, IL;
Joel Seligson, Misgav, IL;
Andrew Hill, San Jose, CA (US);
Ohad Bachar, Timrat, IL;
Amnon Manassen, Haifa, IL;
Yung-Ho Alex Chuang, Cupertino, CA (US);
Ilan Sela, Haifa, IL;
Moshe Markowitz, Haifa, IL;
Daria Negri, Nesher, IL;
Efraim Rotem, Hod Hasharon, IL;
KLA-Tencor Corp., Milpitas, CA (US);
Abstract
Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.