The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Aug. 26, 2009
Applicants:

Hitoshi Kato, Oshu, JP;

Yasushi Takeuchi, Oshu, JP;

Shigehiro Ushikubo, Oshu, JP;

Hiroyuki Kikuchi, Oshu, JP;

Inventors:

Hitoshi Kato, Oshu, JP;

Yasushi Takeuchi, Oshu, JP;

Shigehiro Ushikubo, Oshu, JP;

Hiroyuki Kikuchi, Oshu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/452 (2006.01); C23C 16/458 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01); H01J 1/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32559 (2013.01); C23C 16/45517 (2013.01); C23C 16/45563 (2013.01); C23C 16/45565 (2013.01); C23C 16/45578 (2013.01); C23C 16/50 (2013.01); C23C 16/505 (2013.01); C23C 16/509 (2013.01); C23C 16/5093 (2013.01); H01J 1/00 (2013.01); C23C 16/452 (2013.01); C23C 16/45536 (2013.01); C23C 16/45551 (2013.01); C23C 16/4584 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01);
Abstract

An activated gas injector includes a flow passage defining member partitioned into a gas activation passage and a gas introduction passage by a partition wall; a gas introduction port through which a process gas is introduced into the gas introduction passage; a pair of electrodes to be supplied with electrical power to activate the process gas, wherein the electrodes extend along the partition wall in the gas activation passage; through-holes formed in the partition wall and arranged along a longitudinal direction of the electrodes, wherein the through-holes allow the process gas to flow from the gas introduction passage to the gas activation passage; and gas ejection holes provided in the gas activation passage along the longitudinal direction of the electrodes, wherein the gas ejection holes allow the process gas activated in the gas activation passage to be ejected therefrom.


Find Patent Forward Citations

Loading…