The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2015
Filed:
Mar. 15, 2012
Akinobu Kakimoto, Yamanashi, JP;
Satoshi Takagi, Yamanashi, JP;
Toshiyuki Ikeuchi, Yamanashi, JP;
Katsuhiko Komori, Yamanashi, JP;
Kazuhide Hasebe, Yamanashi, JP;
Akinobu Kakimoto, Yamanashi, JP;
Satoshi Takagi, Yamanashi, JP;
Toshiyuki Ikeuchi, Yamanashi, JP;
Katsuhiko Komori, Yamanashi, JP;
Kazuhide Hasebe, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A disclosed film deposition method includes steps of loading plural substrates each of which includes a pattern including a concave part in a reaction chamber in the form of shelves; depositing a silicon oxide film on the plural substrates by supplying a silicon-containing gas and an oxygen-containing gas to the reaction chamber; etching the silicon oxide film deposited on the plural substrates in the step of depositing by supplying a fluorine-containing gas and an ammonia gas to the reaction chamber; and alternately repeating the step of depositing and the step of etching.