The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Jun. 01, 2010
Tsunehiro Sakai, Mito, JP;
Shigeki Kurihara, Hitachinaka, JP;
Yutaka Tandai, Hitachinaka, JP;
Tamao Ishikawa, Hitachinaka, JP;
Yuichi Hamamura, Yokohama, JP;
Tomohiro Funakoshi, Hitachinaka, JP;
Seiji Isogai, Hitachinaka, JP;
Katsuhiko Ichinose, Tokorozawa, JP;
Tsunehiro Sakai, Mito, JP;
Shigeki Kurihara, Hitachinaka, JP;
Yutaka Tandai, Hitachinaka, JP;
Tamao Ishikawa, Hitachinaka, JP;
Yuichi Hamamura, Yokohama, JP;
Tomohiro Funakoshi, Hitachinaka, JP;
Seiji Isogai, Hitachinaka, JP;
Katsuhiko Ichinose, Tokorozawa, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A defect image processing apparatus uses a normalized cross correlation to image-match a layout image () acquired from a design data with an image acquired by removing, from a defect image (), the defect area portions thereof, and displays, as a result of that matching, a layout image and defect image () on the display device. In the displayed layout image & defect image (), not only the layout image, the layer of which is the same as that of the defect image (), but also a layout image of another layer is displayed superimposed on the defect image (). This makes it easier to analyze the factor of a systematic defect having occurred due to a positional relationship with another layer.